MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202641075424 A) filed by Vellore Institute Of Technology on June 18, 2026, for Waterless Fabric Cleaning System With Ai-Based Contaminant Extraction.
Inventors include K. Santhi; Gowsik V; and Pendekanti Sai Deepthi.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: ABSTRACT WATERLESS FABRIC CLEANING SYSTEM WITH AI-BASED CONTAMINANT EXTRACTION A waterless fabric cleaning system (100) comprises a cleaning chamber (110) configured to receive garments and an imaging system (120) configured to capture images of the garments. An artificial intelligence processing engine (130) analyzes the captured images to determine contamination characteristics and generates a cleaning profile. An airflow management system (140) directs pressurized air toward the garments to dislodge particulate contaminants. An electrostatic contaminant extraction system (150) generates electrostatic fields to attract and extract fine particulate matter. An ultrasonic treatment module (160) generates high-frequency mechanical vibrations to loosen embedded contaminants from fabric fibers. A contaminant collection subsystem (170) captures contaminants removed from the garments. The cleaning chamber (110), airflow management system (140), electrostatic contaminant extraction system (150), ultrasonic treatment module (160), and contaminant collection subsystem (170) operate without the use of water.
Disclaimer: Curated by HT Syndication.
