MUMBAI, India, Sept. 14 -- Intellectual Property India has published a patent application (202617058928 A) filed by Sterile State, Inc. on May 08, 2026, for Water-Based Nitric Oxide Generating/Releasing Materials.
Inventor includes Frost, Megan Cecelia.
The application for the patent was published on September 11, 2026, under issue no. 37/2026.
Abstract: Compositions and methods are presented for water-based production of a polymer that has nitrosothiols. In preferred aspects, a two-component polymer system maintains a thiol compound and a nitrite compound physically separate. The two component system can then be applied to a surface in a water based method and heated to evaporate the water and melt the polymer, thereby allowing formation of the nitrosothiol that will, upon cooling of the polymer, release nitric oxide from the nitrosothiol.
Disclaimer: Curated by HT Syndication.
