MUMBAI, India, July 30 -- Intellectual Property India has published a patent application (202621070326 A) filed by Dr. Priyanka Arora; Dr. Parimala Kulkarni; Mr. Atul Kumar; Dr. Shikha Mali; Dr. Anoop Kumar; Dr. M Srinivas; Dr. Gayatri Harishchandra Giramkar; Smita Khare; Reena Sharma; and Farman Hussain on June 05, 2026, for Theoshield: Theobromine Dental Varnish.
Inventors include Dr. Priyanka Arora; Dr. Parimala Kulkarni; Mr. Atul Kumar; Dr. Shikha Mali; Dr. Anoop Kumar; Dr. M Srinivas; Dr. Gayatri Harishchandra Giramkar; Smita Khare; Reena Sharma; and Farman Hussain.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: [06] Dental caries remains one of the most common chronic oral diseases in children and is mainly associated with acid-mediated demineralization of enamel caused by cariogenic microorganisms. Fluoride varnishes are widely used for caries prevention; however, concerns related to accidental ingestion, dosage 5 control, and fluorosis risk in young children have encouraged the search for safer non-fluoride remineralizing alternatives. The present work proposes Theoshield, a theobromine-based dental varnish designed for sustained contact with the enamel surface. The formulation contains 2% theobromine as the active remineralizing agent, shellac as the film- forming resin, ethanol as the volatile 10 solvent, PEG 400 as the plasticizer, glycerin as the humectant, mint as the flavoring agent, and phenoxyethanol as the preservative. A 100 g batch formulation was developed to obtain a smooth, brushable varnish capable of forming a thin adherent film on tooth enamel. The proposed varnish is intended 15 to improve enamel resistance by supporting hydroxyapatite crystal strengthening and reducing acid dissolution. The formulation is particularly targeted for pediatric dental use because of its non-fluoride active component, acceptable flavor, and rapid film-forming characteristics. This work presents the formulation design, functional role of each ingredient, proposed manufacturing 20 method, mechanism of action, quality evaluation parameters, and experimental validation plan for future in-vitro and clinical assessment. Accompanied Drawing [FIG. 1] [FIG. 2]
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