MUMBAI, India, June 19 -- Intellectual Property India has published a patent application (202647067581 A) filed by Asml Netherlands B. V. on May 29, 2026, for Systems And Methods For Motion Control In A Semiconductor Manufacturing Apparatus.
Inventors include Bustraan, Krijn, Frederik; Finney, Nathan, Robert; Delpuerto, Santiago E.; Huang, Yang-Shan; De Bruijn, Ron, Geeraard, Catharina; and Burroughs, John, Robert.
The application for the patent was published on June 05, 2026, under issue no. 23/2026.
Abstract: A motion control system is described. The motion control system includes a releasable coupling coupled to a fine positioning stage and a coarse positioning stage. The releasable coupling is configured to mechanically couple the fine positioning stage to the coarse positioning stage during coarse positioning movements to transfer movement force from the coarse positioning stage to the fine positioning stage, and mechanically release the fine positioning stage from the coarse positioning stage during a processing operation such that the fine positioning stage is mechanically and dynamically decoupled from the coarse positioning stage. This release facilitates precision movements of the fine positioning stage. Mechanically coupling the fine positioning stage to the coarse positioning stage during coarse positioning movements facilitates reducing a required mass, volume, and/or energy consumption of fine positioning stage actuators, because these actuators need only control the relatively shorter stroke constant velocity movement of the fine positioning stage.
Disclaimer: Curated by HT Syndication.
