MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202617054670 A) filed by Albemarle Corporation on April 29, 2026, for Systems And Methods For Disproportionation Of Silicon Oxide For Anode Materials.
Inventors include Martinolich, Andrew J.; and Zhang, Yinzhi.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: The present disclosure is directed to systems and methods of producing disproportionated silicon oxide composite particles. The disproportionated silicon monooxide composite particles can be produced by mixing an alkali metal salt and/or an alkaline earth metal salt, a carbon precursor, a liquid medium, and silicon monooxide particles to form a precursor suspension. The precursor suspension can be heated to form a powder that includes disproportionated silicon monooxide particles having a coating comprising alkali metal and/or alkaline earth metal, wherein the disproportionation of the silicon monoxide is at least 30%.
Disclaimer: Curated by HT Syndication.
