MUMBAI, India, Aug. 31 -- Intellectual Property India has published a patent application (202611049140 A) filed by Indraprastha Institute Of Information Technology Delhi Iiit-Delhi on April 17, 2026, for Systems And Methods For Analysis Of Gait And Movement Implemented Through A Foot-Wearable Structure.
Inventors include Singh, Karanjeet; Agarwal, Yash; Verma, Manish; and Jha, Alok Nikhil.
The application for the patent was published on August 28, 2026, under issue no. 35/2026.
Abstract: Disclosed is a system (100) for analysis of gait and movement implemented through a foot-wearable structure. A plurality of pressure sensing units (108), positioned across a plurality of plantar regions, generates plantar pressure signals based on deformation during user movement. At least one inertial measurement unit captures motion parameters associated with the user movement, and a processing unit communicatively coupled to the pressure sensing units (108) and the inertial measurement unit (110). The processing unit (102) is configured to receive the plantar pressure signals, receive the motion parameters, generate biomechanical indicators based on a time-synchronized multi-modal fusion of the plantar pressure signals and the motion parameters, and detect at least one biomechanical anomaly based on the biomechanical indicators. The system (100) further includes a feedback generation unit (114) configured to generate at least one feedback signal in response to detection of the biomechanical anomaly.
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