MUMBAI, India, Oct. 26 -- Intellectual Property India has published a patent application (202641122984 A) filed by Indian Space Research Organisation on October 14, 2026, for System For Chemical Vapour Infiltration And Deposition With Real-Time Substrate Mass-Gain Measurement.
Inventors include Dipoo Kumar; Anil Painuly; V Vinu Viswanath; Santhosh B; Deepak Kumar Agarwal; and N. Gomathi.
The application for the patent was published on October 23, 2026, under issue no. 43/2026.
Abstract: The present disclosure relates to a system (100) for chemical vapour infiltration and deposition (CVI/CVD) with real-time mass-gain measurement of a porous substrate (10). The system includes a reactor chamber (1) defining a reaction zone, a gas flow control system introducing a precursor gas and a diluent gas, a heating system (9), and a vacuum pump (17). A load cell (11) is arranged at an upper portion of the reactor chamber (1), and a suspension assembly couples the porous substrate (10) to the load cell (11) within the reaction zone. An electrical vacuum feed-through (8) transmits an output signal from the load cell (11) to a microcontroller unit (14). The microcontroller unit (14) determines real-time mass gain and material-deposition rate based on the output signal. A display unit (15), data storage system (13), and communication interface (16) provide presentation, storage, and communication of mass-gain data.
Disclaimer: Curated by HT Syndication.
