MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202641033634 A) filed by Jk Tyre & Industries Limited on March 20, 2026, for System And Method For Optimizing Plyline Layout Of Radial Tires.
Inventors include Hr, Praveen Kumar; Francies, Thomas; Rao, Dr. K V Narasimha; and Sherief, Abdul Jafar.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: SYSTEM AND METHOD FOR OPTIMIZING PLYLINE LAYOUT OF RADIAL TIRES The present invention provides system and method for optimizing plyline layout of radial tires based on an iterative simulation-driven optimization process. The system comprises a geometry processing module, a geometric inflation module, a deformation mapping engine, a layout updating module, a finite element analysis simulation module, and an optimization logic module. The optimization module is configured to compute convergence values of geometry deformation differentials of the radial tire under rated conditions of inflation and loading in simulation, wherein the optimization logic module either terminates the optimization process when the convergence values are less than a predefined threshold representing an acceptable residual deformation or iteratively performs a simulation of preceding FEA-predicted plyline layout based on preceding geometric deformation differential until the optimization criterion of convergence values being less than the predefined threshold is met. The system further comprises a user interface module configured to receive instructions from and provide instructions to an input/output interface in forms including command-line input, graphical input, and graphical output.
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