MUMBAI, India, July 31 -- Intellectual Property India has published a patent application (202411099571 A) filed by Chairman, Defence Research & Development Organization; and Indian Institute Of Technology, Madras Iit Madras on December 16, 2024, for System And Method For Deposition Of Conformal Coatings Using Magnetron Sputtering.
Inventors include Sasikumar Krishnamoorthy; Dhanalakshmi Sathiskumar; Priya Vedanarayanan; Akilandeswari Palaniswamy; Jagath Rajesh Kumar; Mamidanna Sri Ramachandra Rao; Arunachalam Narayanaperumal; Sathyan Subbiah; Boominatha Sellarajan Sellakumar; Mrinal Dwivedi; Rajaguru Jeyamohan; Vignesh Rethinam; Venkatesan Baskaran; and Obla Ramanandam Nandagopan.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: The present subject matter discloses a system and method for deposition of conformal coatings using magnetron sputtering. The system includes a plurality of components including a vacuum chamber (117), a horizontal magnetron gun (118) with primary and secondary nozzles for curved and flat surface coating, a sample holder (110), a dual power supply system (103), and a cooling system. A cylindrical sample (119) is placed within the vacuum chamber (117) and subjected to a sputtering process using the magnetron dual gun. The system is capable of handling cylindrical samples of various sizes and geometries. The method involves preparing the sample surface, evacuating the chamber, generating a plasma, sputtering material from the target substrate, and depositing the sputtered material onto the said surface. The subject matter addresses the limitations of traditional coating techniques, particularly for inner surface coatings.
Disclaimer: Curated by HT Syndication.
