MUMBAI, India, Oct. 12 -- Intellectual Property India has published a patent application (202641117746 A) filed by Bonam Venkata Chalamayya Institute Of Technology And Science on October 01, 2026, for System And Method For Automated Detection And Localization Of Manufacturing Defects.
Inventors include Pranav Sagar Saladi; Guttula Ramesh; V Sai; and M Venkata Rao.
The application for the patent was published on October 09, 2026, under issue no. 41/2026.
Abstract: ABSTRACT System and Method for Automated Detection and Localization of Manufacturing Defects The present invention is directed to a system and method for automated detection and localisation of manufacturing defects in a manufactured article. The system includes an adaptive multimodal inspection assembly configured to acquire synchronised optical, geometric, thermal, acoustic, vibration or other physical inspection signals. A spatial registration module aligns the signals to a common coordinate system . A defect-signature module detects anomalous regions and an uncertainty module calculates inspection uncertainty . An adaptive inspection controller dynamically adjusts parameters for sensing, illumination, positioning, acquisition or excitation and triggers targeted reinspection of suspect regions. Initial and verification inspection data are correlated to provide a probable defect-origin coordinate, spatial boundary, propagation characteristic and severity representation. The system also links localised defect information to manufacturing-process parameters and produces a technical feedback signal for re-inspection, rejection, diversion, robotic handling or process adjustment, enabling adaptive, spatially precise, resource-efficient, and closed-loop manufacturing defect inspection.
Disclaimer: Curated by HT Syndication.
