MUMBAI, India, Sept. 14 -- Intellectual Property India has published a patent application (202621090880 A) filed by Symbiosis International Deemed University on July 25, 2026, for Synthesis Of Cu-Doped Nico2o4 Thin Films For Electrochemical Anodic Water Splitting.
Inventors include Dr. Ravindra Nathuji Bulakhe; Dr. Dhanaji Balaso Malavekar; Ms. Shital Sadashiv Bachankar; Mr. Nilesh Sadashiv Bachankar; and Prof. Chandrakant R. Sonawane.
The application for the patent was published on September 11, 2026, under issue no. 37/2026.
Abstract: ABSTRACT SYNTHESIS OF Cu-DOPED NiCo2O4 THIN FILMS FOR ELECTROCHEMICAL ANODIC WATER SPLITTING The present invention discloses a method for synthesizing copper-doped nickel cobalt oxide (Cu-NiCo2O4) thin films on conductive substrates using aqueous alkaline bath electrodeposition. The electrolyte bath (110) contains nickel (112), cobalt (114), and copper (116) precursor salts maintained at pH 9.0 to 11.0. Deposition is performed at 297 to 317 K under controlled potential using a DC power supply (130). The Cu-doped NiCo2O4 thin film coating (140) exhibits a cubic spinel crystal structure with porous nanosheet morphology. The binder-free electrode demonstrates an overpotential of 160 mV at 10 mA cm-2 current density with a Tafel slope of 90.6 mV dec-1 for the oxygen evolution reaction in alkaline media. The invention provides enhanced electrocatalytic activity, improved conductivity, and structural stability, making the electrode suitable for sustainable hydrogen production and electrochemical energy conversion applications. [
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