MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202617073236 A) filed by Kokusai Electric Corporation on June 12, 2026, for Substrate Processing Method, Method For Manufacturing Semiconductor Device, Program, And Substrate Processing Device.
Inventors include Matsuno, Yutaka; Seino, Atsuro; and Ogawa, Arito.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: Provided is a technique with which it is possible to control the orientation of crystal particles in a film (or in a layer). The method includes a step for forming a film on a substrate by performing a cycle for forming layers on the substrate a prescribed number of times by performing (a) a step for supplying a raw material gas containing a halogen element to the substrate, and (b) a step for supplying a reaction gas to the substrate, the cycles being performed under a prescribed formation condition on the basis of a prescribed relationship between the amount of the halogen element included in the layer and the proportion of the film occupied by crystal particles oriented in a prescribed crystal plane.
Disclaimer: Curated by HT Syndication.
