MUMBAI, India, Sept. 7 -- Intellectual Property India has published a patent application (202617085639 A) filed by Tokyo Electron Limited on July 13, 2026, for Substrate Processing Device, Substrate Processing Method, And Storage Medium.
Inventors include Kagawa, Koji; Aratake, Hidemasa; Yamamoto, Ryo; and Yamashita, Masami.
The application for the patent was published on September 04, 2026, under issue no. 36/2026.
Abstract: This substrate processing device comprises: a processing tank; a lid body; a chemical solution supply unit; a pressurization unit; and a control unit. The processing tank has an opening in the upper part thereof, and in the processing tank, a substrate is immersed in a chemical solution and processed. The lid body is configured so as to be able to seal the opening of the processing tank. The chemical solution supply unit supplies the chemical solution to the processing tank. The pressurization unit pressurizes the chemical solution on the upstream side of the chemical solution supply unit. The control unit controls the aforementioned units. The control unit causes: the substrate to be immersed in the chemical solution stored in the processing tank; the lid body to seal the opening of the processing tank; the chemical solution pressurized by the pressurization unit to be supplied from the chemical solution supply unit to the processing tank; and the chemical solution stored in the processing tank to be pressurized.
Disclaimer: Curated by HT Syndication.
