MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202641113844 A) filed by Anurag University on September 23, 2026, for Stability-Indicating Analytical System And Method For Profiling And Characterization Of Riluzole Degradation Impurities.

Inventors include Dr. Savita Belwal; and Krushnaveni Gollapalli.

The application for the patent was published on September 25, 2026, under issue no. 39/2026.

Abstract: ABSTRACT A stability-indicating analytical system (100) is provided for profiling and structurally characterizing degradation impurities of Riluzole. The system (100) comprises a stress treatment module (101) configured to subject Riluzole to oxidative, acidic, basic, thermal, and photolytic stress conditions to generate degradation products; a chromatographic analysis module (102) configured to perform LC–MS analysis of stressed samples for detecting and separating the degradation products; a degradation product isolation module (103) configured to isolate the separated degradation products using Preparative HPLC; a structural elucidation module (104) configured to characterize the isolated degradation products using HRMS, FTIR, and 2D NMR; and a stability interpretation module (105) configured to correlate stress, chromatographic, isolation, and structural information to establish degradation pathways and a stability profile of Riluzole. The system (100) particularly identifies, isolates, and structurally characterizes four oxidative degradation products, DP1–DP4, thereby providing analytical information for impurity profiling and stability assessment of Riluzole. The figure associated with abstract is Fig. 1.

Disclaimer: Curated by HT Syndication.