MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202617070956 A) filed by Mller Textil Gmbh on June 08, 2026, for Spacer Fabric And Cushion Assembly.
Inventors include Mller, Stefan; Gckel, Heide; and Zimmermann, Klaus.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: The invention relates to a spacer fabric comprising two fabric layers (1) and spacer threads (2) which connect the fabric layers (1). The fabric layers (1) have loops which follow one another in a production direction (P) with an average loop spacing a, wherein the fabric layers (1) have openings (3) which extend over a length l along the production direction (P), said length l equaling more than 2*a, and the openings (3) of the two fabric layers (1) substantially overlap with one another and form corresponding opening pairs (4). In at least some of the opening pairs (4), at least one respective pair (5) of spacer thread portions (6) is provided, said spacer thread portions crossing each other and extending over a transverse direction (Q) of the openings (3). The number of pairs (5) of crossing spacer thread portions (6) at the aforementioned opening pairs (4) is less than l/2a.
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