MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202641072990 A) filed by Saveetha Institute Of Medical And Technical Sciences on June 12, 2026, for Sinometric Precision Elevator.
Inventors include Preety R; Subhasree Rohinikumar; and Deepak Nallaswamy Veeraiyan.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: Abstract The present invention relates to a surgical instrument designed for use in maxillary sinus augmentation procedures in implant dentistry. The SinoMetric'M Precision Elevator is a specialized sinus membrane elevation instrument incorporating an integrated membrane-thic:;kness mapping mechanism that enables real-time intraoperative assessment of Schneiderian membrane thickness prior to and during elevation. The instrument comprises a calibrated, atraumatic elevator tip combined with a micro-scale measurement system capable of detecting and displaying sinus membrane thickness at multiple points along the sinus floor. The device may incorporate mechanical, tactile, pressure-sensitive, or digital sensing elements to quantify membrane resistance and correlate it with thickness measurements. This allows clinicians to identify thin or high-risk areas before membrane perforation occurs. By providing quantitative intraoperative mapping of membrane thickness, the invention enhances surgical precision, reduces the risk of sinus membrane perforation, improves graft stability, and increases overall procedural predictability. The device is particularly beneficial in lateral window and transcrestal sinus lift procedures and may be adapted for both manual and powered surgical systems. The invention offers a significant advancement over conventional sinus elevators, which rely solely on tactile sensation without objective thickness assessment, thereby improving safety and clinical outcomes in maxillary sinus augmentation surgeries.
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