MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202647109216 A) filed by Toray Industries, Inc. on September 11, 2026, for Single-Layer Woven Fabric.
Inventors include Chen, Yuan; Xiong, Tingping; Zhu, Yifei; Gao, Jinhua; Sun, Qian; and Maeda Nobuhiro.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: A single-layer woven fabric is disclosed. On one surface of the woven fabric, protrusions and recesses are alternately distributed in the warp direction and/or the weft direction. The width W of the protrusions is 150-1200 µm, and the ratio K of the height H of the protrusions to the width W is 0.4-2.0, where the relationship is expressed as: K = H(µm)/W(µm). The single-layer woven fabric has an excellent knit-like appearance, good elasticity, outstanding snag resistance, and excellent wrinkle resistance. The fabric is comfortable to wear, and can be widely applied in the manufacture of business shirts, long skirts, jackets, and trousers.
Disclaimer: Curated by HT Syndication.
