MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202647111493 A) filed by Versum Materials Us, LLC on September 17, 2026, for Selective Deposition Of Aluminum-Containing Dielectric Material On Dielectric Over Metals Utilizing Silanes.
Inventors include Cheng, Lanxia; Hoang, Son; Zope, Bhushan; and Lei, Xinjian.
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: A method for selectively passivating a substrate, wherein the substrate includes at a first surface comprising a first metal and at least a second surface comprising a second metal, preferably a metal nitride, and a third surface comprising a dielectric material. The method includes the step of exposing the substrate to at least one silane wherein the silane selectively reacts with the first surface and the second surface to passivate the first surface and the second surface thereby leaving the third surface substantially unreacted.
Disclaimer: Curated by HT Syndication.
