MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202647075828 A) filed by Asml Netherlands B. V. on June 19, 2026, for Scrubber System, Euv Radiation Source And Euv Utilization System Comprising The Same, And Method Of Removing Contamination.
Inventors include Van Drent, William, Peter; and Ma, Yue.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: A scrubber system for an EUV radiation source, wherein the scrubber system comprises a conduit having an entrance configured to receive gas and contamination and an exit configured to output gas from which contamination has been removed, the scrubber system further comprising scrubber vanes and a cooling circuit configured to carry cooling fluid, the scrubber vanes and the cooling circuit being located within the conduit.
Disclaimer: Curated by HT Syndication.
