MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202441040513 A) filed by Eicher Motors Limited on May 24, 2024, for Rotor Lamination Profile Optimization For Maximum Reluctance Torque And Improved Thermal Behavior.
Inventors include Ramkumar Mani; and Ranjani Padmanabhan.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: ABSTRACT ROTOR LAMINATION PROFILE OPTIMIZATION FOR MAXIMUM RELUCTANCE TORQUE AND IMPROVED THERMAL BEHAVIOR The present invention provides a rotor lamination profile for a permanent magnet synchronous machine (PMSM) comprising at least one rotor stack including a plurality of laminated magnetic sheets, configured to reduce eddy current losses. It includes at least a plurality of permanent magnets disposed within the rotor stack, the magnets being positioned in magnet slots and adapted to generate a rotor magnetic field. It also includes a plurality of magnet-free regions formed between adjacent magnet slots to enable magnetic flux transfer between poles. Further includes a plurality of pole barriers provided along a quadrature axis (q-axis) flux path, each pole barrier being formed of a non-magnetic material, and arranged within the rotor stack to increase magnetic reluctance along the q-axis. The pole barriers are configured to reduce qaxis inductance (Lq) and thereby increase the saliency ratio (Ld/Lq) of the rotor and the rotor is adapted to generate enhanced reluctance torque based on the increased saliency ratio, and the rotor lamination profile is adapted to provide improved torque output and thermal performance
Disclaimer: Curated by HT Syndication.
