MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617096438 A) filed by Sumitomo Seika Chemicals Co. , Ltd. on August 10, 2026, for Resin Aqueous Dispersion Composition.
Inventors include Hayamizu, Naohisa; and Omura, Emika.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: Provided is a resin aqueous dispersion composition that has a suitable viscosity and excellent handling properties and that exhibits excellent barrier properties (water resistance and water vapor barrier property) when a film is formed (for example, when the coating film is formed). More specifically, the following aqueous dispersion composition is provided. An aqueous dispersion composition according to the present invention contains a copolymer containing a constituent unit derived from a compound having an ethylene skeleton and a constituent unit derived from acrylic acid, and ammonia, wherein the content of the constituent units derived from acrylic acid in the copolymer is 5-19 mass%, and the degree of resin neutralization calculated by the following formula is 5-10 mass%. (Formula) Degree of resin neutralization (mass%)=[content (mass%) of constituent units derived from acrylic acid in the copolymer] ×[molar ratio (mol%) of ammonia to constituent units derived from acrylic acid in the copolymer]/100
Disclaimer: Curated by HT Syndication.
