MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202617063912 A) filed by Air Products And Chemicals, Inc. on May 20, 2026, for Removal Of Hydrogen Impurity From Gas Streams.
Inventors include Overa, Sean Michael; Lau, Garret C.; Yeh, Thomas M.; and Casteel, Jr. , William J..
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: A process for removing hydrogen from a dry gas comprising hydrogen as an impurity using at least one layer comprising, e.g., consisting of, hopcalite is improved where the hopcalite has a zero-point-of-charge (ZPC) in a range from about 6.9 to about 7.7 and/or an ionic conductivity as a 10 wt % slurry in deionized water of no more than about 500 µS/cm.
Disclaimer: Curated by HT Syndication.
