MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202647068574 A) filed by Applied Materials, Inc. on June 01, 2026, for Process Modeling Platform For Substrate Manufacturing Systems.
Inventors include Kothnur, Prashanth; Moradian, Ala; Kelkar, Umesh Madhav; Stout, Philip; Ramamurthi, Badri; Ramanathan, Karthik; Bhoj, Ananth; and Zhao, Dalong.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: In one aspect of the present disclosure, a method includes obtaining, by a processing device, input data indicative of a first set of process parameters. The method further includes providing the input data to a first process model. The method further includes obtaining, from the first process model, first predictive output indicative of performance of a first process operation in accordance with the first set of process parameters. The method further includes providing the first predictive output to a second process model. The method further includes obtaining, from the second process model, second predictive output indicative of performance of a second process operation, different than the first process operation or a repetition of the first process operation, in accordance with the first set of process parameters. The method further includes performing a corrective action in view of the second predictive output.
Disclaimer: Curated by HT Syndication.
