MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202647070362 A) filed by Deinert, Jrgen on June 05, 2026, for Process For Treating An Input Waste Material Having An Initial Content Of Intrinsic Impurities.
Inventors include Meisel, Dennis Max; Deinert, Jrgen; and Schulze, Marcus.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: A process for treating an input waste material is disclosed. The input waste material comprises at least one polymer fraction, the input waste material having an initial content of intrinsic impurities located in the at least one polymer fraction. The process comprises acid washing the input waste material with an acidic solution, followed by removing the acidic solution comprising at least part of intrinsic impurities, thereby obtaining an acid washed output waste material. The process further comprises mixing a non-solvent in a liquid state with the acid washed output waste material in an apparatus for forming an azeotrope mixture of the non-solvent with intrinsic impurities, followed by outputting at least part of intrinsic impurities in a gaseous state from the apparatus, thereby obtaining an acid washed mixed output waste material.
Disclaimer: Curated by HT Syndication.
