MUMBAI, India, Aug. 24 -- Intellectual Property India has published a patent application (202631092232 A) filed by National Institute Of Technology, Rourkela on July 30, 2026, for Process For Stereolithography (sla)-Based Fabrication Of Realistic Human Lung Airway Models.
Inventors include Sameer Kumar Verma; Kishore Singh Patel; and Bukke Kiran Naik.
The application for the patent was published on August 21, 2026, under issue no. 34/2026.
Abstract: ABSTRACT PROCESS FOR STEREOLITHOGRAPHY (SLA)-BASED FABRICATION OF REALISTIC HUMAN LUNG AIRWAY MODELS The present invention relates to a process for fabricating anatomically realistic human lung airway models (116) using medical imaging and stereolithography (SLA)-based additive manufacturing. The process comprises acquiring medical imaging data using a CT scan machine (101), generating airway geometry from DICOM image data (102) and a reconstructed three-dimensional airway model (103), digitally refining the geometry through mesh optimization and artefact removal (104), and generating an optimized digital airway model (105) for fabrication. The model is imported into slicing software (106) to generate layer-wise exposure masks (107) and is fabricated using an SLA printing system (108) and resin vat (109). The fabricated airway components are post-processed, assembled as modular airway segments (114), and integrated to form a lung airway model (116). The resulting model reproduces patient-specific airway anatomy and is suitable for airflow visualization, aerosol transport studies, particle deposition analysis, respiratory device evaluation, disease-specific investigations, and validation of computational respiratory simulations.
Disclaimer: Curated by HT Syndication.
