MUMBAI, India, Sept. 7 -- Intellectual Property India has published a patent application (202617085033 A) filed by Chemetall Gmbh on July 10, 2026, for Pretreatment Of Galvanized Metallic Substrates With Aluminum Oxide Hydroxide Containing Rinsing Solutions.
Inventors include Krausse, Nico; Kasper, Christoph; Hoffmann-Loeser, Petra Andrea; Kolberg, Thomas; Dong, Xu; and Ehlscheid, Tobias Christian.
The application for the patent was published on September 04, 2026, under issue no. 36/2026.
Abstract: The invention relates to a method of pretreating an at least partially galvanized metallic substrate, by cleaning steps with one or more aqueous cleaning compositions; followed by rinsing steps, with one or more aqueous rinsing compositions A; followed by layer forming chemical pretreatment steps with one or more chemical pretreatment compositions; followed by rinsing steps, with one or more aqueous rinsing compositions B, wherein at least one of the rinsing compositions B used contains aluminum oxide hydroxide particles. The invention further relates to a method of coating a metallic substrate, the method comprising the above pretreatment steps followed by applying of one or more coating compositions to form one or more coating layers, each of the one or more coating layer being cured. The invention further relates to a pretreated, at least partially galvanized metallic substrate comprising a chemical pretreatment layer and a layer formed from a rinsing composition, the rinsing composition containing aluminum oxide hydroxide particles, as well as a coated substrate and the use of an aqueous composition containing aluminum oxide hydroxide particles as a rinsing composition after a chemical pre-treatment of an at least partially galvanized metallic substrate.
Disclaimer: Curated by HT Syndication.
