MUMBAI, India, Aug. 31 -- Intellectual Property India has published a patent application (202514109462 A) filed by Korea Institute Of Energy Technology on November 11, 2025, for Post-Treatment Process Of Polymer Separation Membrane For Gas Separation And Gas Separation Membrane Using The Same.
Inventors include Kim, Hyo Won; and Lim, Nam Gyu --.
The application for the patent was published on August 28, 2026, under issue no. 35/2026.
Abstract: The present invention relates to a post-treatment process of a polymer separation membrane for gas separation and a gas separation membrane using the same, and more particularly, to a post-treatment process that increases the separation efficiency of hydrogen by controlling the micro free volume of a polymer film through a double post-treatment process including non-solvent post-treatment and heat treatment. The polymer film modified by the post-treatment process of the present invention exhibits an effect of simultaneous increase in gas permeability and selectivity, and since no chemical structure change occurs, it is applicable to separation membranes of various materials.
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