MUMBAI, India, June 26 -- Intellectual Property India has published a patent application (202514111556 A) filed by Toyota Jidosha Kabushiki Kaisha on November 14, 2025, for Porous Silicon Manufacturing Method, Porous Silicon, Negative Electrode Layer, And Secondary Battery.
Inventors include Naohiro Mashimo; Masafumi Nose; and Hiroo Nozaki -.
The application for the patent was published on June 19, 2026, under issue no. 25/2026.
Abstract: A method of manufacturing a porous silicon, comprising: bringing a raw material containing a silicate into contact with an alkali earth metal gas; and bringing the raw material, which was brought into contact with the alkali earth metal gas, into contact with an acid.
Disclaimer: Curated by HT Syndication.
