MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202647101903 A) filed by Toray Industries, Inc. on August 24, 2026, for Porous Membrane And Method For Producing Porous Membrane.
Inventors include Tachibana Takashi; Shimura Shun; Kobayashi Kentaro; and Kanamori Satoko.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: Conventional porous membranes in which a hydrophobic polymer and a cellulose-based resin are combined experience major deformation of the membrane structure due to steam sterilization, and do not have sufficient heat resistance. Provided as a heat-resistant membrane is a porous membrane in which a hydrophobic polymer and a cellulose-based resin with a high degree of saponification are combined. A porous membrane that solves the aforementioned problem has a hydrophobic polymer as a main component thereof, wherein the porous membrane includes a cellulose-based resin on the surface thereof, and when one face is treated as a surface A and the other face is treated as a surface B, the average pore diameter (hereinafter, surface pore diameter) of the surface A is smaller than than average pore diameter of the surface B, the surface pore diameter of the surface A is 5 to 50 nm, and the water contact angle of the surface A is 40° or less.
Disclaimer: Curated by HT Syndication.
