MUMBAI, India, Sept. 7 -- Intellectual Property India has published a patent application (202624015968 A) filed by Kraton Polymers Nederlands B. V. on February 13, 2026, for Polymer Compositions For Photovoltaic Modules.
Inventors include Yaming Niu; Jiwen Wang; Huixian Yang; and Guanwei Zhou.
The application for the patent was published on September 04, 2026, under issue no. 36/2026.
Abstract: The disclosure relates to an encapsulant film for photovoltaic modules comprising: POE and at least one hydrogenated block copolymer. The hydrogenated block copolymer is selected from: a multi-arm hydrogenated block copolymer (MABC) having a structure of (“R”)nX, X is residue of a coupling agent and n = 4 to 20, a hydrogenated styrenic block copolymer (HSBC), and combinations thereof. The HSBC contains at least one block “R” and at least one block “S.” Each block “S” is composed of vinyl aromatic units, and each block “R” is composed of hydrogenated diene units. The HSBC has a vinyl aromatic unit (VAC) content of 40 wt.%. The encapsulant film after curing has a static friction coefficient of 0.39, and a dynamic friction coefficient of 0.40. The encapsulant film provides improved anti-slip properties, and a balance of transparency and mechanical properties.
Disclaimer: Curated by HT Syndication.
