MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202647077239 A) filed by Novamont S. P. A. on June 23, 2026, for Polymer Composition For Films With Polyether-Polyol Plasticisation System.
Inventors include D'Elicio, Alessandro; Milizia, Tiziana; Russo, Claudio; and Gesti Garcia, Sebasti.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: A polymer composition comprising an aliphatic-aromatic polyester with a high starch or starch derivative content and an improved linear or branched polyether-polyol plasticisation system, particularly suitable for use in the manufacture of films that can be used in the production of products such as waste bags, shopping bags, and food packaging.
Disclaimer: Curated by HT Syndication.
