MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202611090430 A) filed by Indian Institute Of Technology Delhi on July 24, 2026, for Photovoltaic Device And Method For Fabricating A Photovoltaic Cell.
Inventors include Komarala, Vamsi Krishna; Manna, Silajit; Alam, Shahnawaz; and Singh, Son Pal.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: The disclosed photovoltaic device (100) includes a crystalline semiconductor substrate (102), and at least one intrinsic passivation stack disposed on a surface of the crystalline semiconductor substrate (102). The intrinsic passivation stack includes an oxygen-intrinsic hydrogenated amorphous silicon layer (i-a-SiOX:H), and a hydrogenated amorphous silicon layer (i-a-Si:H) disposed adjacent to the oxygen-intrinsic hydrogenated amorphous silicon layer. The intrinsic passivation stack includes a hydrogen-enriched interface region (110) formed by an intermediate hydrogen plasma treatment performed between deposition of the oxygen-intrinsic hydrogenated amorphous silicon layer and deposition of the hydrogenated amorphous silicon layer. The hydrogen-enriched interface region (110) includes hydrogen incorporated into the oxygen-intrinsic hydrogenated amorphous silicon layer to reduce interface defect density and modify electrical transport characteristics of the intrinsic passivation stack.
Disclaimer: Curated by HT Syndication.
