MUMBAI, India, Aug. 31 -- Intellectual Property India has published a patent application (202541014991 A) filed by Jeyavishnu K on February 21, 2025, for Photometric Roll System For Precise Material Usage Measurement And Error Detection.
Inventors include Jeyavishnu K; and Mr. Manish Malhan.
The application for the patent was published on August 28, 2026, under issue no. 35/2026.
Abstract: ABSTRACT Photometric Roll System for Precise Material Usage Measurement and Error Detection The embodiment of the present invention relates to a roll system for measuring material usage, comprising a roll [101] made from materials such as paper or fabric with evenly spaced holes around its circumference, mounted on a rotating spindle. A light source [102], such as an LED or laser, is directed towards the roll, while a photodetector [103] on the opposite side detects light passing through the holes as the roll rotates. The system calculates the roll's speed by measuring the time intervals between consecutive hole detections and estimates the remaining material on the roll. The roll may be coated with a photometric film [106] that reacts to specific light wavelengths, enhancing accuracy and filtering out environmental interference. The system detects misalignments or irregular rotations, triggering an error flag and sending real-time data to a photometric controller. The controller sends corrective signals to the main controller, which adjusts or halts the system as needed, ensuring precise material tracking.
Disclaimer: Curated by HT Syndication.
