MUMBAI, India, Oct. 5 -- Intellectual Property India has published a patent application (202647115799 A) filed by Rolic Technologies AG on September 28, 2026, for Photoalignable Polymeric Material For Forming A Liquid Crystal Alignment Film.
Inventors include Eckert, Jean-Francois; Lincker, Frdric; and Chappellet, Sabrina.
The application for the patent was published on October 02, 2026, under issue no. 40/2026.
Abstract: A photoalignable polymeric material for forming a liquid crystal alignment film comprises repeating units represented by formula (I), (I), wherein P1 is a divalent residue of a diamine HN2- Ar1-X1-NH2; and repeating units represented by formula (II), (II), wherein P2 is a divalent residue of a diamine HN2-Ar2-X2-Ar3-NH2; and wherein Q is a tetravalent residue of a cyclobutylene tetracarboxylic dianhydride Further provided is a process for producing the photoalignable polymeric material, a liquid crystal alignment film and a process for forming the film, as well as a liquid crystal alignment film optical device comprising the liquid crystal alignment film. The photoalignable polymeric material minimizes light leakage and improves the dark state of liquid crystal displays.
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