MUMBAI, India, June 22 -- Intellectual Property India has published a patent application (202641070643 A) filed by Indian Institute Of Science on June 05, 2026, for Patterned Porous Elastomer Film For A Sensor Device.
Inventors include Sanjiv Sambandan; and Chithra Parameswaran.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: ABSTRACT PATTERNED POROUS ELASTOMER FILM FOR A SENSOR DEVICE The present disclosure relates to methods and system for obtaining a patterned porous elastomer film, which may be used for manufacturing sensor arrays or electronics substrates. The method employs a first porous elastomer film formed by curing a first elastomer precursor comprising a curable elastomer resin and a leavening agent. The first porous elastomer film is used as a lithography mask to expose a first photosensitive photoresist layer, which is then developed to form a patterned photoresist structure. From this structure, a phase mask is fabricated by applying, curing, and separating a second elastomer film. The phase mask is then used in a proximity nano patterning configuration to expose a second photosensitive photoresist layer, generating 3D porous features that are developed into a patterned photoresist template. A third elastomer precursor is applied on the patterned photoresist template, cured, and separated to yield a patterned porous elastomer film. [Fig. 1]
Disclaimer: Curated by HT Syndication.
