MUMBAI, India, Aug. 31 -- Intellectual Property India has published a patent application (202617081114 A) filed by Oxford University Innovation on July 01, 2026, for Passivatied A/M/X Material.
Inventors include Snaith, Henry James; and Lin, Yen-Hung.
The application for the patent was published on August 28, 2026, under issue no. 35/2026.
Abstract: The invention provides a photovoltaic device which comprises a passivated A/M/X material, wherein the passivated A/M/X material comprises a crystalline A/M/X material and a passivating agent, wherein the crystalline A/M/X material comprises a compound of formula [A]a[M]b[X]c wherein: [A] comprises one or more A cations; [M] comprises one or more M cations which are metal or metalloid cations; [X] comprises one or more X anions; a is a number from 1 to 6; b is a number from 1 to 6; and c is a number from 1 to 18, and wherein the passivating agent comprises an organic compound, wherein the organic compound comprises a silane moiety and (a) does not comprise an amine moiety, or (b) comprises an amine moiety which is a secondary amine, a tertiary amine or a quaternary amine, or the passivating agent comprises a dimer or a polymer of the organic compound. The invention also provides the use of the above-defined passivated A/M/X material as a sensitizer in a photovoltaic device. The present invention also relates to processes for producing a passivated A/M/X material and then (a) producing a photovoltaic device comprising the passivated A/M/X material or (b) using the passivated A/M/X material as a sensitizer in a photovoltaic device.
Disclaimer: Curated by HT Syndication.
