MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202617074034 A) filed by Powall Holding B. V.; and Nederlandse Organisatie Voor Toegepast- on June 15, 2026, for Particulate Composite Iridium Oxide Materials And Preparation Method And Application Thereof.
Inventors include Van Dijk, Bas; and Ruszin, Aaron.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: The present application discloses a method for producing an iridium oxide film on a particulate substrate having an electrical conductivity of 0.01 S/cm (as detected by powder measurements) by chemical vapour deposition, comprising: (i) providing the particulate substrate in a reaction chamber; (ii) contacting the particulate substrate with a vaporized iridium oxide precursor gas, thereby forming a homogenously distributed film of iridium precursor material on the substrate; (iii) contacting the material comprising the homogenously distributed layer with a vaporized oxidant to allow the oxidant to react with the homogenously distributed iridium precursor film on the substrate; and (iv) optionally, repeating until steps (ii) to (v); to obtain a particulate material comprising a surface film of a desired thickness comprising homogeneously distributed discrete iridium oxide clusters with an average diameter in the range of from 0.5 to 5 nm.
Disclaimer: Curated by HT Syndication.
