MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202611099426 A) filed by Noida International University on August 17, 2026, for Novel Oxalic Acid-Based Electroless Nickel Plating Bath Composition And Method For Depositing Uniform Nickel Coatings On Metallic Substrates.
Inventors include Garima Singh; and Nikhil Kumar Goyal.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: The present invention concerns a novel bath composition for electroless nickel depositions on metallic substrates and a method of depositing uniform, adherent, wear resistant and corrosion resistant nickel coatings on metallic substrates without the use of external electrical current. Plating bath consists of nickel salt as a nickel source, oxalic acid auxiliary reducing/stabilizing agent, ethylenediaminetetraacetic acid (EDTA) as a complexing agent, sodium hydroxide as a pH adjusting agent, potassium phosphate as a buffering agent, and water as a solvent medium. The disclosed method can be comprised in doing the following: active the surface of a metallic substrate, such as by active treating through a pre-treatment with zinc, perform optionally a double zincating active treatment, wash or dip the metallic substrate into the plating bath which is heated and kept at a temperature of 65°C to 75°C, then rinse and dry the treated metallic substrate. This resulting nickel coating is uniformly thick, has good adhesion, has a higher hardness, is more wear-resistant and is more corrosion-resistant. It contains very low concentrations of hydrazine and hydrazine derivatives, making it safer, environmentally friendly and industrial friendly as compared to other conventional hydrazine based electroless nickel plating processes, which have stable bath chemistry and consistent coating performance.
Disclaimer: Curated by HT Syndication.
