MUMBAI, India, Aug. 24 -- Intellectual Property India has published a patent application (202631097980 A) filed by National Institute Of Technology Agartala on August 13, 2026, for Novel Dry Stacked Interlocking Masonry Brick System.
Inventors include Dr. Manu S Nadesan; Prof. Rajib Saha; and Ms. Shamulailatpam Rishika.
The application for the patent was published on August 21, 2026, under issue no. 34/2026.
Abstract: The present disclosure relates to an interlocking masonry system for mortar free or dry stacked construction. The system comprises a plurality of masonry units, each formed as a substantially cuboidal body having a top surface and a bottom surface provided with complementary interlocking features. The top surface includes an elevated longitudinal groove having at least one inclined engagement surface, and the bottom surface includes a recessed longitudinal groove having a complementary inclined engagement surface. In a vertically stacked arrangement, the elevated groove of one masonry unit is received in the recessed groove of an adjacent masonry unit so that the inclined engagement surfaces cooperate to provide a self aligning, mortar free interlocking engagement. In preferred implementations, first and second masonry unit types with oppositely oriented recessed grooves are arranged in alternating courses to form a wall assembly that redistributes loads along inclined interface planes and provides a non linear, labyrinth type path at horizontal joints to inhibit moisture ingress.
Disclaimer: Curated by HT Syndication.
