MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202647085539 A) filed by Henkel AG & Co. Kgaa on July 13, 2026, for Non-Fluorinated Polymer Additives And Related Methods.
Inventors include Galvez, Miguel; and Zhang, Bong June.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: Compositions comprising non-fluorinated polyhedral oligomeric silsesquioxane (POSS)-based compounds, and related articles, methods, and kits, are generally described. In an exemplary set of embodiments, the non-fluorinated POSS-based compound comprises a POSS molecule functionalized with a variety of suitable functional groups, including, for example, polydialkylsiloxane (e.g., polydimethylsiloxane) groups, tris(trialkylsiloxy)silane (e.g., tris(trimethylsiloxy)silane) groups, (meth)acrylate groups, phenyl groups, substituted phenyl groups, amine groups, azide groups, isocyanate groups, –C1-C10 alkyl groups, allyl groups, alcohol groups, epoxy groups, thiol groups, and/or acidic groups.
Disclaimer: Curated by HT Syndication.
