MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202541025695 A) filed by Sujan Kolurmath on March 21, 2025, for Modular Process For Producing Graded High-Purity Quartz Silica.
Inventor includes Sujan Kolurmath.
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: A method is disclosed for producing graded high-purity silicon dioxide from natural quartz. The method includes contamination-controlled comminution utilizing non- ferrous contact surfaces; aqueous scrubbing and desliming; magnetic separation; reverse flotation of aluminosilicate gangue; thermal activation by calcination at 900- 1100°C followed by rapid quenching to open micro-inclusions; and grade-dependent chemical leaching. For higher purity grades, quartz is subjected to a mixed-acid leach including hydrochloric acid, nitric acid, sulfuric acid, and dilute hydrofluoric acid under ultrasonic agitation in a pressurized reactor. For ultra-high purity grades, a high-temperature halogen treatment utilizing an anhydrous Cl2/HCl mixture is applied to remove lattice-related impurities, followed by vacuum heat treatment at 1400-1600°C to reduce hydroxyl species and dopants. The purified silica is filtered using low-contamination media, washed with ultrapure water, dried, and packaged under controlled conditions.
Disclaimer: Curated by HT Syndication.
