MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202631085181 A) filed by Jyotirishwar Kumar on July 11, 2026, for Modular Differential Quench Masking Fixture For Controlling Shaft And Plate Distortion.
Inventor includes Jyotirishwar Kumar.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: A modular fixture (100) for immersion quenching comprises a tank-compatible frame (110), a common docking interface (115), and an interchangeable shaft carrier (200) or plate carrier (300). Independently positionable masking modules (220, 320) include fluid- impeding regions and exposure windows (222, 322). Stand-off elements (226) maintain controlled non-zero gaps between the masks and a workpiece (521, 522), thereby forming restricted flow passages that establish a selected spatial variation in quench-medium access. Compliant supports (230, 330) locate the workpiece while permitting thermal expansion and contraction. A shaft embodiment uses axially movable part-annular masks and an upper guide that permits axial contraction. A plate embodiment uses opposed sliding mask panels and distributed supports. The fixture retrofits an existing tank without submerged powered actuators and allows mask position, exposure area, gap and support preload to be recorded and tuned to reduce bending or warping while maintaining a required hardness response. FIG. 1.
Disclaimer: Curated by HT Syndication.
