Intellectual Property India Publishes Patent Application for Modified Minimally Intensive Layer Delamination (mild) Method For The Synthesis Of Mxene (ti3c2tx)

MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202511070540 A) filed by Indian Institute Of Technology, Jammu on July 24, 2025, for Modified Minimally Intensive Layer Delamination (mild) Method For The Synthesis Of Mxene (ti3c2tx).

Inventors include Rohini, Rani; and Srivastava, Priyam.

The application for the patent was published on July 03, 2026, under issue no. 27/2026.

Abstract: A novel modified-minimally intensive layer delamination (MILD) method for synthesizing MXene (Ti3C2Tx) is disclosed. The method comprises: forming an in-situ HF by mixing lithium fluoride (LiF) with excess aqueous hydrochloric acid (HCl) under stirring; gradually adding Ti3AlC2 MAX phase to the mixture; conducting simultaneous magnetic stirring and ultrasonic agitation at controlled temperature for 24 hours; separating, washing, and filtering the resulting colloidal dispersion; and drying and pulverizing the recovered MXene.

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