MUMBAI, India, June 26 -- Intellectual Property India has published a patent application (202441098757 A) filed by Hitachi Energy Ltd on December 13, 2024, for Method Of Detecting A Fault In A Dedicated Metallic Return Line Or In An Electrode Line In A Bipolar Hvdc System And Bipolar Hvdc System Comprising A Fault Detector.
Inventors include Ying-Jiang Hafner; Saurav Choudhury; and Adil Abdalrahman.
The application for the patent was published on June 19, 2026, under issue no. 25/2026.
Abstract: A method of detecting a fault in a DMR line (6a-6e) or in an electrode line (13) in a bipolar HVDC system (1) comprises creating an AC current (iharm) in the DMR line (6a-6e) or in the electrode line (13) during bipolar operation of the HVDC system (1), measuring currents (i1, i2) at two or more locations in the DMR line (6a-6d) or in the electrode line (13), calculating the difference (DRMS) between the currents (i1, i2) and determining if the difference (DRMS) is larger than a pre-defined threshold level (L) for detecting a fault (12) in the DMR line (6a-6e) or in the electrode line (13). Significant Figure: Fig. 2
Disclaimer: Curated by HT Syndication.
