MUMBAI, India, June 19 -- Intellectual Property India has published a patent application (202617057277 A) filed by Basf Se on May 05, 2026, for Method For Purifying Acrylic Acid By Means Of A Recycled Gas Recirculation Process.
Inventors include Becker, Stefan Wendelin; Schulz, Lukas; Blaschke, Tim; and Hammon, Ulrich.
The application for the patent was published on June 05, 2026, under issue no. 23/2026.
Abstract: The invention relates to a method for purifying acrylic acid by means of a recycled gas recirculation process, having the steps a) to f). Initially, the acrylic acid is part of a product gas mixture (PGM) which additionally contains auxiliary components and optionally water. In step a), the product gas mixture (PGM) is separated into a raw acrylic acid stream (RAS) and an auxiliary component stream (NKS) in a separating column (T-Kol). Then, in step b), the raw acrylic acid stream (RAS) is removed from the separating column (T-Kol). In step c), at least one part of the auxiliary component stream (NKS) is supplied to a splitting column (S-Kol) from the bottom of the separating column (T-Kol). In step d), at least one part of the auxiliary component stream (NKS) is split in the splitting column (S-Kol), thereby producing monomeric acrylic acid. In step e), the monomeric acrylic acid is removed at the head of the splitting column (S-Kol) as part of a recycled gas stream (KGS). In step f), at least one part of the recycled gas stream (KGS) is supplied to the separating column (T-Kol), wherein at least one part of the recycled gas stream (KGS) is introduced into the separating column (T-Kol) above the point where the product gas mixture (PGM) is supplied to the separating column (T-Kol).
Disclaimer: Curated by HT Syndication.
