MUMBAI, India, June 19 -- Intellectual Property India has published a patent application (202617056702 A) filed by Basf Se on May 04, 2026, for Method For Purifying Acrylic Acid By Means Of A Mother Acid Recirculation Process.
Inventors include Becker, Stefan Wendelin; and Hammon, Ulrich.
The application for the patent was published on June 05, 2026, under issue no. 23/2026.
Abstract: The invention relates to a method for purifying acrylic acid by means of a mother acid recirculation process, having the steps a) to e). Initially, the acrylic acid is part of a product gas mixture (PGM) which additionally contains auxiliary components and optionally water. In step a), the product gas mixture (PGM) is separated into a raw acrylic acid stream (RAS) and an auxiliary component stream (NKS) in a separating column (T-Kol). Then, in step b), the raw acrylic acid stream (RAS) is removed from the separating column (T-Kol) and guided to a device (V1). In step c), the raw acrylic acid stream is further purified in said device (V1), thereby producing a purified acrylic acid (AAS) and a mother acid (MS). In step d), the obtained mother acid (MS) is removed from the device (V1) and optionally divided into two mother acid streams (MS-a and MS-b). In step e), the mother acid (MS) or optionally a part thereof is recirculated into the separating column (T-Kol) as a mother acid stream (MS-a), wherein at least the process of recirculating a part of the mother acid (MS) or optionally the mother acid stream (MS-a) is carried out above the point in the separating column (T-Kol) where the raw acrylic acid stream (RAS) is removed.
Disclaimer: Curated by HT Syndication.
