MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202647101264 A) filed by Sumitomo Seika Chemicals Co. , Ltd. on August 21, 2026, for Method For Producing Water Absorbent Resin Particles.
Inventor includes Chiba Mikito.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: Disclosed is a method for producing water absorbent resin particles, the method including: preparing an aqueous liquid that contains a water-soluble ethylenically unsaturated monomer, water, and a radical polymerization initiator; forming a reaction liquid that contains the aqueous liquid, a dispersion medium, and a dispersion stabilizer in a polymerization tank; introducing an inert gas into the polymerization tank; forming a polymer of the water-soluble ethylenically unsaturated monomer by means of reversed phase suspension polymerization in the reaction liquid; and obtaining polymer particles that contain the polymer from the reaction liquid. The temperature of the reaction liquid at the time when the introduction of the inert gas into the polymerization tank is started is 47°C to 70°C inclusive.
Disclaimer: Curated by HT Syndication.
