MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617092527 A) filed by Sumitomo Seika Chemicals Co. , Ltd. on July 30, 2026, for Method For Producing Water-Absorbent Resin Particles And Water-Absorbent Resin Particles.
Inventor includes Nishi, Hideyuki.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: The present invention provides a method which is for producing water-absorbent resin particles, which comprises a step for obtaining polymer particles by subjecting a water-soluble ethylenically unsaturated monomer to reverse-phase suspension polymerization in a hydrocarbon dispersion medium, and by which water-absorbent resin particles having a narrow particle size distribution are obtained. Provided is a method for producing water-absorbent resin particles, said method comprising a step for obtaining polymer particles by subjecting a water-soluble ethylenically unsaturated monomer to reverse-phase suspension polymerization in a hydrocarbon dispersion medium. The reverse-phase suspension polymerization is carried out in two or more stages. The method comprises a step for aggregating the polymer particles in the presence of a dispersion stabilizer. Two or more types of (poly)glycerol fatty acid esters which differ in precipitation temperature when a 0.46 mass% heptane solution is used as the dispersion stabilizer are used.
Disclaimer: Curated by HT Syndication.
