MUMBAI, India, June 26 -- Intellectual Property India has published a patent application (202618066787 A) filed by Panasonic Intellectual Property Management Co. , Ltd. on May 27, 2026, for Method For Producing Synthetic Resin And Method For Fixing Carbon Dioxide.
Inventors include Furuta, Tsutomu; Kotani, Yuki; Nakamura, Masahiro; Yaguchi, Mitsuo; Kobayashi, Nobuyuki; and Oshio, Shozo.
The application for the patent was published on June 19, 2026, under issue no. 25/2026.
Abstract: The problem to be overcome by the present disclosure is to provide a method for producing a synthetic resin (X) that may reduce environmental impact while the synthetic resin (X) is being produced. A method for producing a synthetic resin (X) according to an aspect of the present disclosure includes allowing a first material (A) and a second material (B) to react with each other. The first material (A) has been synthesized in a process step including allowing carbon dioxide to react with hydrogen. The second material (B) has been synthesized from carbon dioxide and is different from the first material (A).
Disclaimer: Curated by HT Syndication.
