MUMBAI, India, June 26 -- Intellectual Property India has published a patent application (202618066786 A) filed by Panasonic Intellectual Property Management Co. , Ltd. on May 27, 2026, for Method For Producing Synthetic Resin And Method For Fixing Carbon Dioxide.
Inventors include Furuta, Tsutomu; Kotani, Yuki; Nakamura, Masahiro; Kobayashi, Nobuyuki; Yaguchi, Mitsuo; and Oshio, Shozo.
The application for the patent was published on June 19, 2026, under issue no. 25/2026.
Abstract: The problem to be overcome by the present disclosure is to provide a method for producing a synthetic resin (X) that may reduce environmental impact while the synthetic resin (X) is being produced. A method for producing a synthetic resin (X) according to an aspect of the present disclosure includes allowing a first material (A) and a second material (B) to react with each other. The first material (A) includes carbon derived from biomass. The second material (B) has been synthesized from carbon dioxide and is different from the first material (A).
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